Moum Technology Co. Ltd. Okhla, Delhi, DL

We offer Xenon Mercury Deep Uv Short Arc Lamp. Xenon mercury uv lamp. lamp wattage : 200~1000wattage. life time : 2000 hour uv intensity : 3000mw/cm2

We offer Super high pressure mercury lamp is high illuminant lamp that has been effectively irradiating the 3 lines (365nm, 405nm, 436nm) with long life and stable illuminant light. since arc size is extremely close the light source point, it is readily focused and diffused optically, and supply the uniform uv intensity. it is used in the semiconductor, lcd, color filter, pdp, pcb., etc that needs high illuminant uv intensit

We are offering sterilizing ultraviolet lamp. Uv rays is very effective in sterilizing the food poisoning bacteria.

We offer Metal Halide Ultraviolet Lamp. Overall length : 250mm~ 2600mm lamp wattage : 1000watt~ 36000watt. Lamp diameter : 25 ~ 30mm as per the customer request. Metal halide (fe or gallium type) uv lamps to be used in exposure, screen printing, and curing., etc.

We are offering High Pressure Mercury Uv Lamp. We have large variety of lamps with different specification and also we can make lamps according to your specifications (length,arc length,lamp capacity,voltage current,power etc.)

We offer Halogen Lamp. Our company is specialized in special use of halogen lamps, to be used in rtp machine and r&d, also inspection machine., etc. any size, and any wattage for special use can be supplied with the reasonable price and high qualities.

We are offering excimer ultraviolet lamp. It is used in lcd manufacturing process,surface activation of various resin and metals,environment technology etc. 1. Semiconductor surface cleaning of silicon wafers, activation of surface, soft etching, pre-coating treatment, cvd oxidation layer 2. Flat panel dry cleaning of glass substrate, lcd manufacturing process, activation of surface, array process, cell process, surface modification of c/f surface 3. Environment technology creation of ozone, anti-pollution of water/air, ultra pure water manufacturing process, decomposition of chlorine-based organic compounds 4. Surface modification surface activation of various resin and metals