Sputtering Target Dealers

HHV provides high performance sputtering targets in a wide range of materials, sizes and forms. This includes precious metals and non-precious metals, engineered specialty alloys, ceramics...

Boride Ceramic Sputter Targets: Cr2B, CrB, CrB2, Cr5B3, FeB, HfB2, LaB6, Mo2B, Mo2B5, NbB, NbB2, TaB, TaB2, TiB2, W2B, WB, VB, VB2, ZrB2 Carbide Ceramic Sputter Targets: B4C, Cr3C2, HfC, Mo2C, NbC, SiC, TaC, TiC, WC, W2C, VC, ZrC Fluoride Ceramic Sputter Targets : AlF3, BaF3, CdF2, CaF2, CeF3, DyF3, ErF3, HfF4, KF, LaF3, PbF2, LiF, PrF3, MgF2, NdF3, ReF3, SmF3, NaF, Cryolite, Na3AlF6 , SrF2, ThF4, YF3, YbF3 Nitrides Ceramic Sputter Targets: AlN, BN, GaN, HfN, NbN, Si3N4, TaN, TiN, VN, ZrN Oxide Ceramic Sputter Ttargets: Al2O3, Sb2O3, ATO ,BaTiO3, Bi2O3, CeO2, ZnO,WO3,Nb2O5,,Cu2O,ITO,CuO, Cr2O3 ,Dy2O3 ,Er2O3, Eu2O3, Gd2O3, Ga2O3, GeO2, HfO2, Ho2O3, In2O3, ITO, Fe2O3, Fe3O4, La2O3, PbTiO3, PbZrO3, LiNbO3, Lu3Fe5O12, Lu2O3, MgO, MoO3, Nd2O3, Pr6O11, Pr(TiO2)2, Pr2O3, Sm2O3, Sc2O3, SiO2, SiO, SrTiO3, SrZrO3, Ta2O5, Tb4O7, TeO2, ThO2, Tm2O3, TiO2, TiO, Ti3O5, Ti2O3, SnO2, SnO, WO3, V2O5, YAG, Y3Al5O12, Yb2O3, Y2O3, ZnO, ZnO:Al, ZrO2(unstabilized), ZrO2-5-15wt%CaO) Selenides Ceramic Sputter Targets: Bi2Se3, CdSe, CuSe, Ga2Se3, In2Se3, PbSe, MoSe2, NbSe2, TaSe2, WSe2, ZnSe Silicides Ceramic Sputter Targets: Cr3Si, CrSi2, CoSi2, HfSi2, MoSi2, NbSi2, TaSi2, Ta5Si3, TiSi2, Ti5Si3, WSi2, V3Si, VSi2, ZrSi2 Sulfides Ceramic Sputter Targets: AgS, Ag2S, CuS, Cu2S, Sb2S3, As2S3, CdS, FeS, GaS, GeS, PbS, SnS, In2S3, MoS2, NbS1.75, TaS2, WS2, ZnS Tellurides Ceramic Sputter Targets: Al2Te3,Bi2Te3, CdTe, CuTe, Ga2Te3, GeTe, PbTe, MoTe2, NbTe2, TaTe2, TmTe, WTe2, ZnTe Others: AZO, Cr-SiO, CIGS, ITO, TiZrO3, PbZrTiO3, LaSrMnO3, SrRuO3, IGZO, GaAs, Ga-P, GaSb, In-Sb, InAs, InP, InSn, LSMO, Na3AlF6 , YBCO, LCMO, YSZ

We supply sputtering targets which is manufactured under show unparalleled outstanding performance by virtue of high density, excellent purity, and distinguished homogeneous microstructure. The popular geometries featuring with both planar and rotatable shapes, such as circular, rectangular, ring, tube, cylinder and conicity, are all available. If you have your own unique requirements about the sputtering targets, no matter in density, purity, homogeneity or in geometry, please let us know exactly what you need. We'll do our utmost to meet your requirements precisely.

Semi Conductor Sputtering Target, Quadurupole Mass Spectromete

Sputtering Targets, Diamond Cutting Laser Mirror, Fluorescence Filte

Sputtering Targets, Piezo Ceramics, Magnetic Components, Sanitary Product

Sputtering Target, Metal Nanopowder, Oxide Nanopowder, Silicon Wafer

Sputtering Targets and Substrates, Piezo Ceramics, Magnet

Platinum Sputtering Target, Iridium Wire, Iridium Foil, Iridium Strip

Sputtering Targets, NESLAB CC Series of Immersion Coolers, Nexde

Sputtering Targets, Silicon Wafers, Diamond Scribe

Sputtering Target, Magnetron Cathode, Tube Furnace, Vacuum Valve

Sputtering Targets, Evaporation Equipments, UHV Feed through Terminal

Nickel Sputtering Target, Boron Carbide Powder, Titanium Nut Bolt

Aluminum Sputtering Targets

Sputtering Target, Antimony Tin Oxide Nano Powder, Synthetic Graphite Sheet