Vritra Technologies Krishna Nagar, Delhi

high purity metal, alloy, ceramic, semiconductor and other customized sputter and pulsed laser deposition targets. Sputter targets are available with and without copper backing plate as required.targets can be customized in any dimensions.

Type : Sputtering Target

Material : Aluminum, Copper, Metal, Titanium, All metals

Shape : Round, Rectangular

Purity : 99%, 99.99%

Feature : Strong Structure

Finishing : Non Polished, Polished

Packaging Type : Vaccum Bag

Application : Laboratory

Model Number : ARDU CURRENT 1.0

Brand Name : Vritra Technologies

Warranty : 6 months

Customized high Purity silicon wafers, Si+SiO2 wafer, Silicon on Insultors wafers for industrial and research applications. Wafer are customized as per your requirements. Kindly provide details like orientation, doping etc for customization.

Type : Wafers

Shelf Life : 1year

Customized ITO & FTO coated glass/PET.To purchase kindly provide following details:DimensionsResistivityThicknessTransparency

Thickness : Customized

Purity : >99%

Surface Treatment : Polished

high purity single crystal substrate of mgo, gadolinium gallium garnet, lithium tantalate (litao3) , gallium oxide beta β-ga2o3 crystal, litao3  420y-cut, fe: srtio3 , zirconia (ysz), lanthanum aluminate (laalo3), niobium-doped strontium titanate (nb: srtio3), terbium gallium garnet (tgg), aluminum oxide (al2o3) crystal substrate, potassium tantalum (ktao3),strontium titanate (srtio3), lithium aluminate (lialo2), zinc selenide, srtio3, and many more..

Shape : Round